Imaging nanometer-thick patterned self-assembled monolayers via second-harmonic generation microscopy
作者:
L. Smilowitz,
Q. X. Jia,
X. Yang,
D. Q. Li,
D. McBranch,
S. J. Buelow,
J. M. Robinson,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 81,
issue 5
页码: 2051-2054
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.364284
出版商: AIP
数据来源: AIP
摘要:
We have used the inherent surface sensitivity of second-harmonic generation to develop an instrument for nonlinear optical microscopy of surfaces and interfaces. This optical technique is ideal for imaging nanometer-thick, chromophoric self-assembled monolayers (SAMs), which have been patterned using photolithographic techniques. In this paper, we demonstrate the application of second-harmonic generation microscopy to patterned SAMs of the noncentrosymmetric molecule calixarene and discuss the resolution and sensitivity limits of the technique. ©1997 American Institute of Physics.
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