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KrF(B) quenching by He, Ne, Xe, and NF3

 

作者: J. G. Eden,   R. W. Waynant,   S. K. Searles,   R. Burnham,  

 

期刊: Journal of Applied Physics  （AIP Available online 1978）
卷期: Volume 49, issue 11  

页码: 5368-5372

 

ISSN:0021-8979

 

年代: 1978

 

DOI:10.1063/1.324505

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Flash photolysis of KrF2at 193 nm has been utilized to directly measure the quenching rate constants of KrF(B) molecules by He, Ne, Xe, and NF3. Investigation of the large rate constant measured for the KrF(B)+Xe reaction (≳10−9cm3 sec−1) verified the XeF(B) state to be a product.

 

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