Formation of a crystalline phase in amorphous hydrogenated carbon-germanium films by electron beam irradiation
作者:
J. Tyczkowski,
B. Pietrzyk,
R. Mazurczyk,
K. Polan´ski,
J. Balcerski,
M. Delamar,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 20
页码: 2943-2945
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120223
出版商: AIP
数据来源: AIP
摘要:
The influence of electron beam irradiation on morphology of plasma deposited amorphous hydrogenated carbon-germanium films produced from tetramethylgermanium in a three-electrode af reactor has been studied. It has been found that the insulating films are insensitive to this treatment, whereas a crystalline phase occurs in the semiconducting films. Although the molar content of germanium in these films amounts only to about 0.2, the crystalline phase is composed of pure germanium nanocrystals which contain about 70&percent; of the whole amount of germanium existing in the films. The nanocrystals are agglomerated in globules of 50–500 nm in diameter. ©1997 American Institute of Physics.
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