Scanning scattering microscope for surface microtopography and defect imaging
作者:
J. Lorincik,
D. Marton,
R. L. King,
J. Fine,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1996)
卷期:
Volume 14,
issue 4
页码: 2417-2423
ISSN:1071-1023
年代: 1996
DOI:10.1116/1.588871
出版商: American Vacuum Society
关键词: THIN FILMS;SILICON;GERMANIUM;CRYSTAL DEFECTS;SPATIAL RESOLUTION;OPTICAL MICROSCOPES;OPTICAL MICROSCOPY;LIGHT SCATTERING;Si;Ge
数据来源: AIP
摘要:
A recently developed optical‐scatter instrument, the scanning scattering microscope (SSM) produces two‐dimensional images of very small surface features and of variations in surface topography. In its present configuration, the lateral resolution is better than 10 μm and its sensitivity to surface roughness is in the angstrom (rms) range. The performance of the SSM has been demonstrated using calibration gratings, Si(100) surfaces, and Ge thin films grown on silicon; intercomparison also was made with atomic force microscope measurements. These results indicate that this scanned optical technique is a very useful noncontact method for evaluating surface microtopography.
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