首页   按字顺浏览 期刊浏览 卷期浏览 Scanning scattering microscope for surface microtopography and defect imaging
Scanning scattering microscope for surface microtopography and defect imaging

 

作者: J. Lorincik,   D. Marton,   R. L. King,   J. Fine,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1996)
卷期: Volume 14, issue 4  

页码: 2417-2423

 

ISSN:1071-1023

 

年代: 1996

 

DOI:10.1116/1.588871

 

出版商: American Vacuum Society

 

关键词: THIN FILMS;SILICON;GERMANIUM;CRYSTAL DEFECTS;SPATIAL RESOLUTION;OPTICAL MICROSCOPES;OPTICAL MICROSCOPY;LIGHT SCATTERING;Si;Ge

 

数据来源: AIP

 

摘要:

A recently developed optical‐scatter instrument, the scanning scattering microscope (SSM) produces two‐dimensional images of very small surface features and of variations in surface topography. In its present configuration, the lateral resolution is better than 10 μm and its sensitivity to surface roughness is in the angstrom (rms) range. The performance of the SSM has been demonstrated using calibration gratings, Si(100) surfaces, and Ge thin films grown on silicon; intercomparison also was made with atomic force microscope measurements. These results indicate that this scanned optical technique is a very useful noncontact method for evaluating surface microtopography.

 

点击下载:  PDF (418KB)



返 回