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Differences in final state effects for adsorbates on metal and semiconductor surfaces

 

作者: K. Karlsson,   J. Kanski,   O. Nyqvist,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1992)
卷期: Volume 10, issue 4  

页码: 1335-1336

 

ISSN:1071-1023

 

年代: 1992

 

DOI:10.1116/1.585864

 

出版商: American Vacuum Society

 

关键词: POTENTIAL BARRIER;XENON;ADSORPTION;CORE LEVELS;DIELECTRIC FUNCTION;BINDING ENERGY;METALS;SEMICONDUCTOR MATERIALS;PHOTOEMISSION;SCHOTTKY EFFECT

 

数据来源: AIP

 

摘要:

In a recent article we pointed out the importance of final state effects in the context of Schottky‐barrier measurements by core‐level photoemission. Using a wave vector‐dependent image‐screening model, we concluded that final state effects give a substantial contribution to the estimated Schottky‐barrier height. In the present comment the list of supporting evidence is extended by new experimental work emphasizing the difference in final state screening at metal and semiconductor surfaces. We find that the measured differences are well reproduced by the screening model with similar parameters as used in our earlier discussion of Schottky barriers.

 

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