InGaAs shallow junction fabrication using Langmuir–Blodgett film diffusion source
作者:
D. M. Shah,
W. K. Chan,
R. Bhat,
H. M. Cox,
N. E. Schlotter,
C. C. Chang,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 21
页码: 2132-2134
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102994
出版商: AIP
数据来源: AIP
摘要:
A new source of cadmium diffusion in In0.53Ga0.47As has been developed. Langmuir–Blodgett (LB) deposited monolayers of cadmium arachidate have been used as a source of cadmium. The LB film has been characterized by grazing incidence infrared spectroscopy and Auger electron spectroscopy. Acceptor profiles obtained by differential Hall technique are presented. Highly doped (NA=2×1019cm−3) shallow (xj≊0.1–0.4 &mgr;m),p+‐njunctions are obtained. Mesa‐typep‐i‐ndiodes with 125 &mgr;m diameter, ideality factor =1.3,Idark=5 nA at 20 V reverse bias, andVbreakdown=30 V have been fabricated.
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