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InGaAs shallow junction fabrication using Langmuir–Blodgett film diffusion source

 

作者: D. M. Shah,   W. K. Chan,   R. Bhat,   H. M. Cox,   N. E. Schlotter,   C. C. Chang,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 56, issue 21  

页码: 2132-2134

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.102994

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A new source of cadmium diffusion in In0.53Ga0.47As has been developed. Langmuir–Blodgett (LB) deposited monolayers of cadmium arachidate have been used as a source of cadmium. The LB film has been characterized by grazing incidence infrared spectroscopy and Auger electron spectroscopy. Acceptor profiles obtained by differential Hall technique are presented. Highly doped (NA=2×1019cm−3) shallow (xj≊0.1–0.4 &mgr;m),p+‐njunctions are obtained. Mesa‐typep‐i‐ndiodes with 125 &mgr;m diameter, ideality factor =1.3,Idark=5 nA at 20 V reverse bias, andVbreakdown=30 V have been fabricated.

 

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