E.S.R. study of allyl type radicals observed in irradiated polycrystalline thiourea adducts of cycloheptane and cyclohexene
作者:
G.A. Helcké,
R. Fantechi,
期刊:
Molecular Physics
(Taylor Available online 1970)
卷期:
Volume 18,
issue 1
页码: 1-10
ISSN:0026-8976
年代: 1970
DOI:10.1080/00268977000100011
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Allyl type radicals have been observed as the final irradiation products of both cyclohexene and cycloheptane included in thiourea. In the cyclohexene adduct the cyclohexenyl radical appears to be formed straight away, whilst in the cycloheptane adduct the cycloheptyl radical is formed first and, except at low temperatures where it is stabilized, changes to an allyl type radical without further irradiation.
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