首页   按字顺浏览 期刊浏览 卷期浏览 Precipitation of SiO2on dislocations in polycrystalline silicon with a high carbon conc...
Precipitation of SiO2on dislocations in polycrystalline silicon with a high carbon concentration

 

作者: A. Gervais,   T. Moudda‐Azzem,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 60, issue 2  

页码: 789-793

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337430

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Transmission electron microscopy (TEM) observations are reported on defects induced in polycrystalline silicon ribbon during the burn‐off of the carbon support and the diffusion process. Ribbon‐shaped silicon crystals are characterized by a high carbon and oxygen content at their solubility limits. TEM investigations show that SiO2is precipitated as either alpha or beta quartz on the dislocation cores during annealing in O2atmosphere.

 

点击下载:  PDF (421KB)



返 回