Hyperfine interaction in phosphorus-doped amorphous silicon–germanium alloys
作者:
F. Finger,
W. Fuhs,
R. Carius,
期刊:
Philosophical Magazine Letters
(Taylor Available online 1988)
卷期:
Volume 57,
issue 4
页码: 235-240
ISSN:0950-0839
年代: 1988
DOI:10.1080/09500838808214713
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
We present a study of the hyperfine structure in the electron spin resonance spectra of phosphorus-doped a-Si0·7Ge0·3: H. Electron bombardment and annealing are used to vary the defect density and to shift the Fermi level in the range 0·45<EC–EF<0·75 eV. The main observation is that electron bombardment causes an enhancement of the density of hyperfine centres and a major decrease of the hyperfine splitting from 265 to 200G. The data show that phosphorus introduces two hyperfine centres: the well known fourfold coordinated phosphorus atoms Pi and a deep state the density of which can be enhanced by electron bombardment and hydrogen effusion. We suggest that the latter is a dangling-bond state on a twofold coordinated phosphorus (P02).
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