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Mapping the quality of semiconductor wafers

 

作者: J. I. Pankove,   J. E. Berkeyheiser,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1986)
卷期: Volume 57, issue 4  

页码: 674-679

 

ISSN:0034-6748

 

年代: 1986

 

DOI:10.1063/1.1138888

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A new instrument has been developed to map the photovoltaic response of a semiconductor to very penetrating sub‐band‐gap radiation (for silicon, &lgr;=1.3 &mgr;m). The minority carrier density being nearly uniform throughout the thickness of the crystal, the photovoltaic response is dominated by the carrier diffusion length and thus reflects the quality of the material. A computer‐controlled scan of the semiconductor presents a map of the gross quality of the specimen. The actual probe is a small transparent electrode (water) illuminated by an optical fiber carrying 1.3‐&mgr;m light from an LED.

 

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