A study of gettering efficiency and stability in Czochralski silicon
作者:
Scott A. McHugo,
E. R. Weber,
M. Mizuno,
F. G. Kirscht,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 21
页码: 2840-2842
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113447
出版商: AIP
数据来源: AIP
摘要:
Internal gettering efficiencies and stabilities of high and low carbon doped silicon have been compared with standard and ramped annealing conditions. The gettering efficiency of low carbon silicon has been found to be greatly enhanced with ramped annealing by creating a high concentration of oxygen precipitates and related defects. This ramped low carbon material and both the standard and ramped high carbon materials have a greatly enhanced oxygen precipitation rate, relative to the standard low carbon standard anneal. However, the high carbon material’s gettering efficiency and stability are low, compared to the ramped low carbon material, due to a reduction of the oxygen precipitate’s strain field and concentration of related defects. ©1995 American Institute of Physics.
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