Simultaneous imaging of Si(111) 7×7 with atomic resolution in scanning tunneling microscopy, atomic force microscopy, and atomic force microscopy noncontact mode
作者:
Peter Güthner,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1996)
卷期:
Volume 14,
issue 4
页码: 2428-2431
ISSN:1071-1023
年代: 1996
DOI:10.1116/1.588873
出版商: American Vacuum Society
关键词: SILICON;SPATIAL RESOLUTION;Si
数据来源: AIP
摘要:
The reconstructed Si (111) 7×7 surface was imaged in several operation modes of the combined ultrahigh vacuum atomic force microscope/scanning tunnel microscope. By imaging single atom defects on the sample surface a clear proof of the atomic resolution in noncontact mode of the force microscope was possible. By simultaneous measurements of several interaction parameters and by the investigation of force‐distance curves, it was possible to explain the origin of the interaction.
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