A study of electron field emission as a function of film thickness from amorphous carbon films
作者:
R. D. Forrest,
A. P. Burden,
S. R. P. Silva,
L. K. Cheah,
X. Shi,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 73,
issue 25
页码: 3784-3786
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.122894
出版商: AIP
数据来源: AIP
摘要:
The electron field-emission properties of hydrogenated amorphous carbon and nitrogenated tetrahedral amorphous carbon thin films are examined by measuring the field-emission current as a function of the applied macroscopic electric field. The experimental results indicate the existence of an optimum film thickness for low-threshold electron field emission. The predictions of various emission models are compared to the experimental results. ©1998 American Institute of Physics.
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