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Influences of gas flow on chemical vapor deposition of superconducting Nb‐Ge films

 

作者: Mitsumasa Suzuki,   Hiroshi Onodera,   Takeshi Anayama,   Gin‐ichiro Oya,   Yutaka Onodera,  

 

期刊: Applied Physics Letters  (AIP Available online 1981)
卷期: Volume 39, issue 4  

页码: 354-356

 

ISSN:0003-6951

 

年代: 1981

 

DOI:10.1063/1.92727

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Nb‐Ge films, which have been prepared by chemical vapor deposition, have been studied for superconducting transition temperatures, crystal structures, and growth morphology. In the films a relationship was obtained among positions at which the highestTcfilms are deposited, the degree of orientation forA15 crystallites is lowered, and the microstructures for film surface change has been found. This can be explained in terms of a higher deposition rate of Ge than that of Nb.

 

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