Influences of gas flow on chemical vapor deposition of superconducting Nb‐Ge films
作者:
Mitsumasa Suzuki,
Hiroshi Onodera,
Takeshi Anayama,
Gin‐ichiro Oya,
Yutaka Onodera,
期刊:
Applied Physics Letters
(AIP Available online 1981)
卷期:
Volume 39,
issue 4
页码: 354-356
ISSN:0003-6951
年代: 1981
DOI:10.1063/1.92727
出版商: AIP
数据来源: AIP
摘要:
Nb‐Ge films, which have been prepared by chemical vapor deposition, have been studied for superconducting transition temperatures, crystal structures, and growth morphology. In the films a relationship was obtained among positions at which the highestTcfilms are deposited, the degree of orientation forA15 crystallites is lowered, and the microstructures for film surface change has been found. This can be explained in terms of a higher deposition rate of Ge than that of Nb.
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