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Fundamental optical absorption edge of reactively direct current magnetron sputter‐deposited AlN thin films

 

作者: R. Zarwasch,   E. Rille,   H. K. Pulker,  

 

期刊: Journal of Applied Physics  （AIP Available online 1992）
卷期: Volume 71, issue 10  

页码: 5275-5277

 

ISSN:0021-8979

 

年代: 1992

 

DOI:10.1063/1.350592

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Aitaetal. [J. Appl. Phys.66, 4360 (1989)] studied the ultraviolet optical behavior of rf sputter‐deposited AlN thin films. The same optical behavior is found for reactively dc magnetron sputter‐deposited AlN thin films at different total gas flows for constant Ar/N2ratios. The microcrystallites of these films exhibit diameters between 5 and 20 nm.

 

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