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Relationship between surface morphology and strain relaxation during growth of InGaAs strained layers

 

作者: C. Lavoie,   T. Pinnington,   E. Nodwell,   T. Tiedje,   R. S. Goldman,   K. L. Kavanagh,   J. L. Hutter,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 25  

页码: 3744-3746

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115369

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The relationship between the surface morphology and strain relaxation is explored in strained InxGa1−xAs layers grown on GaAs by molecular beam epitaxy.Insitulight scattering, detected simultaneously along [110] and [11¯0], reveals an asymmetric surface roughening which is consistent withexsituscanning force microscopy. Transmission electron microscopy shows that strain relaxation by misfit dislocation formation occurs before the surface roughening is detected, for In0.18Ga0.82As films grown at 490 °C. ©1995 American Institute of Physics.

 

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