Relationship between surface morphology and strain relaxation during growth of InGaAs strained layers
作者:
C. Lavoie,
T. Pinnington,
E. Nodwell,
T. Tiedje,
R. S. Goldman,
K. L. Kavanagh,
J. L. Hutter,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 25
页码: 3744-3746
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.115369
出版商: AIP
数据来源: AIP
摘要:
The relationship between the surface morphology and strain relaxation is explored in strained InxGa1−xAs layers grown on GaAs by molecular beam epitaxy.Insitulight scattering, detected simultaneously along [110] and [11¯0], reveals an asymmetric surface roughening which is consistent withexsituscanning force microscopy. Transmission electron microscopy shows that strain relaxation by misfit dislocation formation occurs before the surface roughening is detected, for In0.18Ga0.82As films grown at 490 °C. ©1995 American Institute of Physics.
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