Photothermal radiometric and spectroscopic measurements on silicon nitride thin films
作者:
M. Nestoros,
A. Gutierrez-Llorente,
A. Othonos,
C. Christofides,
J. M. Martinez-Duart,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 12
页码: 6215-6219
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.366506
出版商: AIP
数据来源: AIP
摘要:
Thin films of silicon nitride of various thicknesses, deposited by radio frequency magnetron sputtering on silicon quartz substrate, have been characterized by laser-induced and frequency scanned photothermal radiometry. Fourier transform infrared spectroscopy was also used to provide a qualitative description of the behavior of the films in the infrared range which shows favourable properties of these coatings to be used in passive cooling applications. ©1997 American Institute of Physics.
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