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Destruction mechanisms for formaldehyde in atmospheric pressure low temperature plasmas

 

作者: Daniel G. Storch,   Mark J. Kushner,  

 

期刊: Journal of Applied Physics  (AIP Available online 1993)
卷期: Volume 73, issue 1  

页码: 51-55

 

ISSN:0021-8979

 

年代: 1993

 

DOI:10.1063/1.353828

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Formaldehyde (CH2O) is a common pollutant of indoor air in residences and commercial buildings. The removal of CH2O from atmospheric pressure gas streams (N2/O2/H2O/CH2O) using plasmas generated by a dielectric barrier discharge has been theoretically investigated with the goal of cleansing indoor air. The model consists of a full accounting of the electron, ion, and neutral chemical kinetics in contaminated humid air. We find that the destruction of CH2O results dominantly from chemical attack by OH and O radicals, with the primary end products being CO and H2O. The predicted destruction rates for CH2O are typically 2–8 ppm/(mJ cm−3) (parts per million of CH2O in air/energy deposition). The elimination of the unwanted byproducts, CO and NO, using a platinum catalyst is discussed.

 

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