Preparation and properties of hydrogenated amorphous silicon films by glow discharge decomposition of silane in cascade reactors
作者:
P. N. Dixit,
R. Bhattacharya,
O. S. Panwar,
V. V. Shah,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 44,
issue 10
页码: 991-993
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.94623
出版商: AIP
数据来源: AIP
摘要:
A novel and economical method for the preparation of the hydrogenated amorphous silicon films by glow discharge composition of silane in two reactors connected in cascade is presented. Whereas the films obtained from the first reactor have nearly the same dark and photoconductivity as reported in literature, those from the second reactor exhibit four orders less dark conductivity and one order less photoconductivity for the same deposition conditions.
点击下载:
PDF
(230KB)
返 回