GaAs surface cleaning by thermal oxidation and sublimation in molecular‐beam epitaxy
作者:
Junji Saito,
Kazuo Nanbu,
Tomonori Ishikawa,
Kazuo Kondo,
期刊:
Journal of Applied Physics
(AIP Available online 1988)
卷期:
Volume 63,
issue 2
页码: 404-409
ISSN:0021-8979
年代: 1988
DOI:10.1063/1.340253
出版商: AIP
数据来源: AIP
摘要:
GaAs surface cleaning by thermal oxidation and sublimation prior to molecular‐beam‐epitaxial growth has been investigated as a means of reducing the carrier depletion at the substrate and epitaxial layer interface. The carrier depletion between the substrate and epitaxial films, measured by aC‐Vcarrier profiling technique, was shown to decrease significantly with an increase in the thickness of the thermal oxidation. The concentration of carbon contamination near the substrate‐epitaxial interface was measured using secondary ion mass spectroscopy. The carbon concentration correlated very well with the carrier depletion. Therefore, the main origin of the carrier depletion is believed to be the carbon concentration of the initial growth surface. Based on these results, the thermal oxidation and sublimation of a semi‐insulating GaAs substrate was successfully applied to improve the mobility and sheet concentration of the two‐dimensional electron gas in selectively doped GaAs/N‐Al0.3Ga0.7As heterostructures with very thin GaAs buffer layers.
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