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Measurement of the electrically induced refractive index change in silicon for wavelength &lgr;=1.3 &mgr;m using a Schottky diode

 

作者: A. F. Evans,   D. G. Hall,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 56, issue 3  

页码: 212-214

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.102834

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We report the results of measurements of the electrically induced refractive index change caused by the free‐carrier effect in a silicon Schottky diode. We find that for the wavelength &lgr;=1.3 &mgr;m, the real part of the refractive index changes by as much as ‖&Dgr;n‖∼0.01 for current densities less than 1 A/cm2. This refractive index change produced changes in the input‐coupling efficiency as large as 75% in our sample geometry.

 

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