Measurement of the electrically induced refractive index change in silicon for wavelength &lgr;=1.3 &mgr;m using a Schottky diode
作者:
A. F. Evans,
D. G. Hall,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 3
页码: 212-214
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102834
出版商: AIP
数据来源: AIP
摘要:
We report the results of measurements of the electrically induced refractive index change caused by the free‐carrier effect in a silicon Schottky diode. We find that for the wavelength &lgr;=1.3 &mgr;m, the real part of the refractive index changes by as much as ‖&Dgr;n‖∼0.01 for current densities less than 1 A/cm2. This refractive index change produced changes in the input‐coupling efficiency as large as 75% in our sample geometry.
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