Effect of substrate temperature and annealing on the structural properties of ZnO ultrafine particle films
作者:
Zhao Dachun,
Qu Zhongkai,
Pan Xiaoren,
Dai Muji,
Sun Minggen,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1997)
卷期:
Volume 15,
issue 4
页码: 805-808
ISSN:1071-1023
年代: 1997
DOI:10.1116/1.589413
出版商: American Vacuum Society
关键词: ZnO
数据来源: AIP
摘要:
ZnO ultrafine particle (UFP) films were deposited on glass andSiO2substrates by a direct current gas discharge activated reactive evaporation method. The effect of substrate temperature and annealing on the structure and morphology of ZnO UFP films was studied by x-ray diffraction and scanning electron microscope. The results show that the spherical island density decreases with increasing annealing temperature and the structure becomes polycrystalline with a (002) preferential orientation as the substrate temperature increases. In addition, angle resolved x-ray photoelectron spectroscopy was used to study the absorption of water on the ZnO UFP film surface by measuring the two deconvoluted peaks for O1s.The two deconvoluted peaks for O1swere located at 533.2 and 534.8 eV. The absorption coefficients of water on the surface were 0.52 and 0.43, respectively, for nonannealed and annealed ZnO UFP films.
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