首页   按字顺浏览 期刊浏览 卷期浏览 Absorption studies at 193 nm ine‐beam excited xenon
Absorption studies at 193 nm ine‐beam excited xenon

 

作者: C. Duzy,   M. J. W. Boness,  

 

期刊: Applied Physics Letters  (AIP Available online 1979)
卷期: Volume 35, issue 12  

页码: 903-905

 

ISSN:0003-6951

 

年代: 1979

 

DOI:10.1063/1.91017

 

出版商: AIP

 

数据来源: AIP

 

摘要:

This study was undertaken in order to determine whether the observed premature 172‐nm laser pulse termination in pure xenon was caused by medium absorption. The absorption was measured by probing thee‐beam excited xenon with an ArF (193 nm) laser. Analysis of the results indicates that premature pulse termination cannot be explained entirely by the observed medium absorption.

 

点击下载:  PDF (244KB)



返 回