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Ferroelectric properties of plzt thin films prepared by mocvd

 

作者: Koji Tominaga,   Yukio Sakashita,   Masaru Okada,  

 

期刊: Integrated Ferroelectrics  (Taylor Available online 1994)
卷期: Volume 5, issue 4  

页码: 287-291

 

ISSN:1058-4587

 

年代: 1994

 

DOI:10.1080/10584589408223885

 

出版商: Taylor & Francis Group

 

关键词: PLZT thin film;MOCVD;leakage current;fatigue

 

数据来源: Taylor

 

摘要:

Lanthanum-modified lead zirconate titanate (PLZT) thin films have been grown on Pt/SiO2/Si substrate at 650[ddot]C by metalorganic chemical vapor deposition. The relative dielectric constant increased as the La content was increased up to about 5 atomic percent (at%). The remanent polarization and coercive field decreased from 30 to 20 μC/cm2and from 53 to 30 kV/cm, respectively, with increasing La content in the range of 0–13 at%. The leakage current of PLZT film was 3 × 10−9A/cm2at an applied voltage of 3 V. The degradation of switched charge density of PLZT film was not observed even at 2 × 1011cycles.

 

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