PbTiO3thin films have been prepared on Si/SiO2substrates by radio frequency planar magnetron sputtering technique. The target used in this experiment consists of multilayers of PbO and TiO2obtained by tape casting and cold pressing. The composition of the film is easily controlled by the thicknesses of the PbO and TiO2layers and also by the surface erosion. Target design and preparation, growth parameters and annealing conditions have been optimized to obtain stoichiometric films in the tetragonal crystal structure without second phase. ©1995 American Institute of Physics.