SiC/Si heterostructure negative-differential-resistance diode for high-temperature applications
作者:
Kuen-Hsien Wu,
Yean-Kuen Fang,
Jyh-Jier Ho,
Wen-Tse Hsieh,
Tzer-Jing Chen,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 72,
issue 23
页码: 3017-3019
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.121526
出版商: AIP
数据来源: AIP
摘要:
In this letter, we report the observation of N-shaped negative-differential-resistance (NDR) characteristics in a SiC/Si heterostructure diode. The typical NDR in this device has a peak-to-valley current ratio (PVCR) of 44 and a high peak current of 4.8 mA at room temperature. A possible model based on the multi-tunneling process was proposed to explain the origin of the NRD in this device. The most attractive feature of this device is its high-temperature NDR characteristics. An obvious NDR with a PVCR of as high as 9 is obtained at 200 °C, indicating that this SiC/Si heterostructure NDR diode is promising for high-temperature electronic applications. ©1998 American Institute of Physics.
点击下载:
PDF
(842KB)
返 回