首页   按字顺浏览 期刊浏览 卷期浏览 Hillock Growth and Stress Relief in Sputtered Au Films
Hillock Growth and Stress Relief in Sputtered Au Films

 

作者: W. B. Pennebaker,  

 

期刊: Journal of Applied Physics  (AIP Available online 1969)
卷期: Volume 40, issue 1  

页码: 394-400

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1657067

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Growth of hillocks has been observed during annealing of sputtered Au films. The height of a hillock is proportional to the area it occupies in the film. This empirical relationship has been used in a model which postulates that hillock growth is associated with stress relief in the Au. The model is able to relate the sign and magnitude of the stress with hillock size and density. The general character of the growth kinetics is also predicted by the model.

 

点击下载:  PDF (610KB)



返 回