Determination of SiO2trapped charge distribution by capacitance‐voltage analysis of undoped polycrystalline silicon‐oxide‐silicon capacitors
作者:
Y. Nissan‐Cohen,
J. Shappir,
D. Frohman‐Bentchkowsky,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 44,
issue 4
页码: 417-419
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.94795
出版商: AIP
数据来源: AIP
摘要:
Capacitance measurements on undoped polycrystalline silicon gate capacitors are used for oxide trapping characterization. In this structure, a field‐effect modulation on both interfaces is observed in a singleC‐Vplot. A variation in the insulator charge state is detected by its effect on both interfaces. The main advantage of this method is that both trapped charge magnitude and centroid are obtained by a single measurement with a minimal disturbance of the charge distribution. The method is demonstrated on thin oxide capacitors subjected to negative or positive charge trapping. The induced positive and negative charge magnitude and location dependence on the injection conditions are measured and analyzed.
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