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Critical resolved shear stress measurements for silicon‐doped GaAs single crystals

 

作者: E. D. Bourret,   M. G. Tabache,   A. G. Elliot,  

 

期刊: Applied Physics Letters  (AIP Available online 1987)
卷期: Volume 50, issue 19  

页码: 1373-1375

 

ISSN:0003-6951

 

年代: 1987

 

DOI:10.1063/1.97860

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The critical resolved shear stress of GaAs single crystals doped with silicon was directly measured using dynamical compression tests at high temperatures. At the melting point the critical resolved shear stress is 0.032 and 0.027 kg/mm2for crystals doped with 1.5×1018and 3×1018cm−3silicon, respectively. These values are lower than that for undoped GaAs. This reinforces our earlier conclusion that solid solution hardening and the reduction of crystallographic glide is not the only mechanism by which dopants reduce the formation of dislocations during the growth of single crystals from the melt.

 

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