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Nitrogen implantation of metals

 

作者: A. Anttila,   J. Keinonen,   M. Uhrmacher,   S. Vahvaselka¨,  

 

期刊: Journal of Applied Physics  (AIP Available online 1985)
卷期: Volume 57, issue 4  

页码: 1423-1425

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.334504

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Sixteen metals implanted to saturation with 300‐keV N2+ions have been studied using nuclear resonance broadening and Rutherford backscattering techniques to profile the implanted concentration. Blisters due to the implanted nitrogen were observed in Mg, Al, Ti, V, Cr, Nb, Mo, Ta, W, and AISI 304 steel but not in Cu, Zr, Ag, Hf, and Au. The nominal saturation concentration at maximum varied from 50 to 60 at. % for all cases except for Cu, Ag, and Au, where it was 20 at. %. The surface hardness was generally increased by a factor between 1.2 and 2.3. However, no increase was observed for Mo, Ag, and Au. The mononitride formation in Ti, Zr, and Hf was verified by x‐ray diffraction. The formation of blisters and diffusion in the preparation of nitrides is discussed.

 

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