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The effect of intensity distribution in the reflected beam on the detection error of monochromatic optical autofocus systems

 

作者: Toru Tojo,   Mitsuo Tabata,   Yoriyuki Ishibashi,   Hitoshi Suzuki,   Susum Takahashi,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1990）
卷期: Volume 8, issue 3  

页码: 456-462

 

ISSN:0734-211X

 

年代: 1990

 

DOI:10.1116/1.585044

 

出版商: American Vacuum Society

 

关键词: REFLECTIVITY;LITHOGRAPHY;VLSI;FABRICATION;WAFERS;ACCURACY;FOCUSING;OPTICAL SYSTEMS;SUBSTRATES

 

数据来源: AIP

 

摘要:

The measurement error induced by the intensity distribution in the reflected beam from the surface of a substrate was studied to improve the focal accuracy of an autofocus system. It is shown that scanning of the probe beam across the wafer surface reduces the effect of nonuniform reflectivity. An accuracy of 0.6 μm can be obtained. A signal processing circuit which accommodates 40 dB of incident intensity range is developed.

 

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