The space-charge-limited-current scaling law in a-SixCy:H
作者:
K. Ibrahim,
J.I. B. Wilson,
期刊:
Philosophical Magazine Letters
(Taylor Available online 1989)
卷期:
Volume 59,
issue 3
页码: 155-158
ISSN:0950-0839
年代: 1989
DOI:10.1080/09500838908206337
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Hydrogenated amorphous silicon-carbon thin-films (a-SixCy: H) were prepared so as to obtain sets of films with different thicknesses for each of two differing growth conditions. Double Schottky barrier electrodes were used to study the space-charge-limited current (SCLC) through each film and the scaling law for this conduction mechanism was tested for each of the two preparative conditions. This scaling law was valid only if the deposition was uninterrupted during movement of a mask which was rotated so as to cover sequentially parts of the substrate. Films which were deposited in several layers, with brief interruptions for mask movement, appear to have additional states at each interface which dominate the bulk states being intentionally probed by the SCLC technique.
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