New fabrication method for 1.3‐&mgr;m GaInAsP/InP buried crescent lasers using a reactive ion beam etching technique
作者:
Akihiko Kasukawa,
Masayuki Iwase,
Yuji Hiratani,
Narihito Matsumoto,
Yoshikazu Ikegami,
Michinori Irikawa,
Susumu Kashiwa,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 51,
issue 22
页码: 1774-1776
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.98518
出版商: AIP
数据来源: AIP
摘要:
A 1.3‐&mgr;m GaInAsP/InP buried crescent laser on ap‐type InP substrate was demonstrated. An active region width narrower than 1.5 &mgr;m was achieved with good controllability and reproducibility using the newly introduced reactive ion beam etching technique for the etching process. Stable fundamental transverse mode operation with low threshold currents of 15–25 mA was obtained. Less than 5% degradation in threshold current at 50 °C was achieved with a constant driving current of 150 mA at 70 °C for 100 h.
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