首页   按字顺浏览 期刊浏览 卷期浏览 Investigation of molecular‐beam epitaxially grown CdTe on GaAs by x‐ray p...
Investigation of molecular‐beam epitaxially grown CdTe on GaAs by x‐ray photoelectron spectroscopy

 

作者: A. Waag,   Y. S. Wu,   R. N. Bicknell‐Tassius,   C. Gonser‐Buntrock,   G. Landwehr,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 68, issue 1  

页码: 212-217

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.347118

 

出版商: AIP

 

数据来源: AIP

 

摘要:

X‐ray photoelectron spectroscopy studies of CdTe‐GaAs interfaces are reported. The growth start of CdTe on GaAs can be nearly stoichiometric if convenient growth parameters are chosen. The valence‐band offset between these two materials is found to be large (470 meV). Cd‐Te‐metal‐GaAs multilayers have been grown with very thin metal films. The CdTe‐GaAs band offset is not influenced by such intermediary metal layers. The experimentally obtained value for the valence‐band offset is compared with recent theoretical calculations taking into account interface dipoles.

 

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