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Ion channeling investigation of the lattice location of Sn atoms in GaAs thin films grown by molecular beam epitaxy

 

作者: Kin Man Yu,   Henry P. Lee,   S. Wang,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 56, issue 18  

页码: 1784-1786

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.103099

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have investigated the lattice location of Sn atoms in Sn‐doped GaAs thin films grown by molecular beam epitaxy using ion channeling techniques. Accumulation of ≊2×1014atoms/cm2of Sn on the GaAs surface was detected. These surface Sn atoms were determined to be randomly distributed within ≊20 A˚ of the surface of the GaAs. Angular scans of the Ga K&agr;, As K&bgr;, and Sn Lx rays across the ⟨100⟩, ⟨110⟩, and ⟨111⟩ axial channels indicated that the Sn atoms in the GaAs layer are mostly substitutional. No displacement of the Sn atoms larger than 0.14 A˚ from the substitutional sites was detected.

 

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