The thermionic emission and work function of U and UO2
作者:
W. McLean,
H.‐L. Chen,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 58,
issue 12
页码: 4679-4684
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.336242
出版商: AIP
数据来源: AIP
摘要:
Thermionic emission measurements have been used to determine the work function (&Jgr;) of pure and oxidized uranium samples between 1100 and 1300 K; Auger electron spectroscopy (AES) was used to verify the cleanliness and compositions of the samples. It was found that impurities present in ppm amounts in the bulk U segregated to the surface upon heating and had an appreciable effect on the zero‐field emission currents as well as the slopes of the Schottky curves obtained at various temperatures. A combination of ion‐sputtering and ultrahigh vacuum (UHV) annealing at high temperatures was successful in reducing the total impurity level on the hot surfaces to 5%. At this low concentration of impurities, well‐behaved Richardson line plots were obtained withA=135 A cm−2 K−2and &Jgr;=3.54 eV for pure U andA=128 A cm−2 K−2and &Jgr;=3.19 eV for UO2. The Schottky coefficients for clean U approached their ideal values at fields >400 V/cm.
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