Electron dissociative attachment rate constants for F2and NF3at 300 and 500 °K
作者:
Daniel W. Trainor,
J. H. Jacob,
期刊:
Applied Physics Letters
(AIP Available online 1979)
卷期:
Volume 35,
issue 12
页码: 920-922
ISSN:0003-6951
年代: 1979
DOI:10.1063/1.91005
出版商: AIP
数据来源: AIP
摘要:
Electron attachment to F2and NF3has been studied in an electron‐beam‐controlled gas‐discharge apparatus over a range ofE/P(2–10 kV/cm atm). These experiments were performed in gas mixtures containing small amounts of the halide molecules (≲1%) in an atmosphere of N2which was included to control the average electron energy. We obtained values for the rate constants for dissociative attachment to F2and NF3as a function of mixture temperature at 300 and 500 °K and applied electric field. These results compare favorably with the rate constants deduced from the absolute cross section for these compounds reported by Chantry.
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