Oxidized treatment of high Tcsuperconducting thin films by plasma‐ion doping technique
作者:
Masatoshi Kitagawa,
Shigenori Hayashi,
Takeshi Kamada,
Tomiyo Yoshida,
Akihisa Yoshida,
Hideaki Adachi,
Takashi Hirao,
Kiyotaka Wasa,
期刊:
AIP Conference Proceedings
(AIP Available online 1990)
卷期:
Volume 200,
issue 1
页码: 122-129
ISSN:0094-243X
年代: 1990
DOI:10.1063/1.39053
出版商: AIP
数据来源: AIP
摘要:
Gd‐Ba‐Cu‐O superconducting thin films were oxidized by an ion doping technique using a microwave electron‐cyclotron‐resonance (ECR) plasma with AC(20kHz) substrate bias at a substrate temperature of 330 °C. Under conditions with the lowest emission intensity ratio of molecular oxygen ions(O2+) to oxygen atoms(O) observed by optical emission from O2plasma, superconducting films did not exhibit superconductivity after treatment. X‐ray diffraction indicated that bonded oxygen atoms were removed from the films by oxygen radical. Under conditions with high O2+/O ratio, the superconducting thin films were not remarkably changed. The effect of oxygen ion doping could be observed.
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