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Aerosol jet etching of fine patterns

 

作者: Y. L. Chen,   J. R. Brock,   I. Trachtenberg,  

 

期刊: Applied Physics Letters  （AIP Available online 1987）
卷期: Volume 51, issue 26  

页码: 2203-2205

 

ISSN:0003-6951

 

年代: 1987

 

DOI:10.1063/1.98940

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Successful demonstration of a new etching technique, aerosol jet etching (AJE), is reported. AJE has been used to pattern fine lines with good anisotropy in silicon dioxide surfaces on silicon substrates using a hydrofluoric acid ultrafine aerosol jet.

 

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