Effect of Cl incorporation on the stability of hydrogenated amorphous silicon
作者:
Jae Seong Byun,
Hong Bin Jeon,
Kyung Ha Lee,
Jin Jang,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 25
页码: 3786-3788
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.115383
出版商: AIP
数据来源: AIP
摘要:
Hydrogenated amorphous silicon (a‐Si:H) films were prepared by remote plasma chemical vapor deposition (RPCVD) using SiH4/SiH2Cl2/He/H2mixtures. With increasing Cl content ina‐Si:H up to about 1019cm−3, the stablity of photoconductivity under light illumination was improved with keeping the defect density and Urbach energy constant. We deposited hydrogenated amorphous silicon films with hydrogen content of 6 at. %, Cl content of ∼1019cm−3, and defect density of 3×1015cm−3, which exhibited very small photoconductivity degradation under light illumination. The optimum Cl concentration ina‐Si:H for stablea‐Si:H appears to be ∼1019 cm−3. ©1995 American Institute of Physics.
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