Effect of Impurities on the Annealing Behavior of Irradiated Silicon
作者:
Mitsuji Hirata,
Masako Hirata,
Haruo Saito,
James H. Crawford,
期刊:
Journal of Applied Physics
(AIP Available online 1967)
卷期:
Volume 38,
issue 6
页码: 2433-2438
ISSN:0021-8979
年代: 1967
DOI:10.1063/1.1709922
出版商: AIP
数据来源: AIP
摘要:
The effect of impurities on the annealing behavior of irradiated silicon was studied through an investigation of isothermal annealing of minority carrier lifetime in silicon crystals containing phosphorus, arsenic, antimony, or bismuth in the temperature range 100°–180°C. The activation energy for the annealing of vacancy‐impurity complex increased with increasing atom size of the dopant. The values are 0.93, 1.27, 1.84, and 2.22 eV. The frequency factor was also found to be dependent on impurity as well as concentration of the complex. The variation of these parameters is discussed in terms of the lattice strain associated with impurity atoms which have a larger covalent radius than silicon.
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