首页   按字顺浏览 期刊浏览 卷期浏览 Synchrotron radiation assisted metalorganic layer epitaxy
Synchrotron radiation assisted metalorganic layer epitaxy

 

作者: Hartmut Höchst,   Mike A. Engelhardt,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1990)
卷期: Volume 8, issue 4  

页码: 686-691

 

ISSN:0734-211X

 

年代: 1990

 

DOI:10.1116/1.584996

 

出版商: American Vacuum Society

 

关键词: ORGANOMETALLIC COMPOUNDS;TIN COMPOUNDS;SYNCHROTRON RADIATION;EPITAXY;PHOTOELECTRON SPECTROSCOPY;WORK FUNCTIONS;PHOTODISSOCIATION;MONOLAYERS;DESORPTION;VAPOR CONDENSATION;CADMIUM TELLURIDES;α‐Sn

 

数据来源: AIP

 

摘要:

Experiments of the photodissociation of tetramethyltin by synchrotron radiation and the epitaxial atomic layer growth of diamond structured α‐Sn films are reported. We used surface sensitive core and valence band photoemission spectroscopy to study the temperature dependence of the condensation and desorption behavior of tetramethyltin on CdTe(100). A quantitative analysis of the deposition and photodissociation of tetramethyltin including the work function change and the evolution of the substrate Te 4dand overlayer Sn 4dintensities during the overlayer deposition suggests that individual monolayers can be grown by the technique of synchrotron radiation assisted metal organic layer epitaxy. The photofragmentation process does not cause a significant carbon build up in the overlayer film. The photodissociated hydrocarbons seem to recombine and desorb from the surface.

 

点击下载:  PDF (450KB)



返 回