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Electron beam‐induced deposition of tungsten

 

作者: David A. Bell,   John L. Falconer,   Zhiming Lü,   Carol M. McConica,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1994）
卷期: Volume 12, issue 5  

页码: 2976-2979

 

ISSN:1071-1023

 

年代: 1994

 

DOI:10.1116/1.587545

 

出版商: American Vacuum Society

 

关键词: THIN FILMS;TUNGSTEN;ELECTRON BEAM EVAPORATION;DECOMPOSITION;ENERGY DEPENDENCE;KEV RANGE 01−10;GROWTH RATE;AES;W

 

数据来源: AIP

 

摘要:

Tungsten films were deposited by decomposing films of frozen tungsten hexafluoride (WF6) with an electron beam and then warming the substrate to remove unreacted WF6. Deposition rates increase with increasing beam intensity.

 

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