Algorithm method of correlation position for automatic alignment in microcircuit fabrication
作者:
Wang Xiangdong,
Du Bingchu,
Wang Ling,
Wu Guowei,
Ge Huang,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1995)
卷期:
Volume 13,
issue 3
页码: 858-861
ISSN:1071-1023
年代: 1995
DOI:10.1116/1.588196
出版商: American Vacuum Society
关键词: ALGORITHMS;MICROELECTRONICS;CORRELATIONS;ALIGNMENT;POSITIONING;INTEGRATED CIRCUITS;FABRICATION;SIMULATION
数据来源: AIP
摘要:
A new algorithm method used to determine the correlation position between two marks for automatic alignment in microcircuit fabrication has been developed. This algorithm maintains the correlation technique advantage such as its high immunity to noise and poor contrast in the mark signal. The alignment overlay precision achieved is better than one pixel. By using this algorithm method, the 486‐33PC computer takes about 4 s to determine the correlation position without any special hardware. This article describes the method along with giving experimental results.
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