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Plasma etching in magnetic multipole microwave discharge

 

作者: Y. Arnal,   J. Pelletier,   C. Pomot,   B. Petit,   A. Durandet,  

 

期刊: Applied Physics Letters  （AIP Available online 1984）
卷期: Volume 45, issue 2  

页码: 132-134

 

ISSN:0003-6951

 

年代: 1984

 

DOI:10.1063/1.95143

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A plasma etching reactor is described which associates surface magnetic confinement, microwave discharge, and independently controlled substrate biasing. Preliminary measurements show that the reactor produces reactive plasmas allowing anisotropic fine line etching at low ion energy.

 

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