Simultaneous depth profiling of constituents and impurities by elastic proton scattering in amorphous hydrogenated silicon films
作者:
R. Schwarz,
J. S. Kolodzey,
S. Wagner,
R. T. Kouzes,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 4
页码: 188-190
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.97657
出版商: AIP
数据来源: AIP
摘要:
Depth profiles of various constituents and impurities of thin films were obtained simultaneously by a nuclear coincidence method. The energy spectrum of elastically scattered 12 MeV protons, measured by a high‐resolution magnetic spectrometer, was used for constituent identification and total content determination. Constituents of interest were selected by software pulse height discrimination and their depth profiles were obtained from the recoil energy spectrum, measured by a surface barrier detector telescope. Thin films of Teflon, of carbon, and of amorphous hydrogenated silicon were measured. The best possible depth resolution is about 20 nm for carbon and is limited by the beam energy spread and the energy resolution of the solid state detectors.
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