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Experimental results from fast electron pattern generator: A variable shaped beam machine

 

作者: E. de Chambost,   B. Allanos,   A. Frichet,   J. Perrocheau,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1986）
卷期: Volume 4, issue 1  

页码: 73-77

 

ISSN:0734-211X

 

年代: 1986

 

DOI:10.1116/1.583397

 

出版商: American Vacuum Society

 

关键词: ELECTRON BEAMS;LITHOGRAPHY;GOLD;BEAM SHAPING;GRATINGS;SILICON;FABRICATION;MASKING;CURRENT DENSITY;SPACE CHARGES;GLASS;FOCUSING;ETCHING

 

数据来源: AIP

 

摘要:

Fast electron pattern generator (FEPG) is a variable shaped beam lithographic system specially designed for direct writing on wafers and for mask fabrication. Experimental results are given: gold gratings on silicon patterned with 10×0.3 μm spots, 1 μm gate field‐effect transistor (FET), masks 1×. All these results performed with a 5 A/cm2current density are consistent with a 1 μm technology. When the spot current exceeds 5 A/cm2, defects due to the space charge effect appear. Thermal effects on glass substrates are pointed out.

 

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