Electron-beam lithography with metal colloids: Direct writing of metallic nanostructures
作者:
J. Lohau,
S. Friedrichowski,
G. Dumpich,
E. F. Wassermann,
M. Winter,
M. T. Reetz,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1998)
卷期:
Volume 16,
issue 1
页码: 77-79
ISSN:1071-1023
年代: 1998
DOI:10.1116/1.589838
出版商: American Vacuum Society
数据来源: AIP
摘要:
We report on the fabrication of metallic nanostructures in the sub-100 nm region by means of electron-beam lithography with metal colloids. A thin organometallic film consisting of surfactant stabilized Pd-colloids(⩽3 nm) is directly patterned by electron-beam irradiation. Non-exposed colloids are easily removed by rinsing the sample with appropriate dissolvers. The metallic character of the nanostructures is checked by resistance measurements. We find the morphology and the resistance behavior of the present nanostructured Pd-colloids to be similar to those of granular thin Pd/C films. Accordingly, the metal content of the nanostructures fabricated with Pd-colloids can be estimated.
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