首页   按字顺浏览 期刊浏览 卷期浏览 Chemical vapor deposition growth and characterization of undoped and doped Ge andGe1&mi...
Chemical vapor deposition growth and characterization of undoped and doped Ge andGe1−xCxquantum dots on Si

 

作者: Chayan Kumar Seal,   Dean Samara,   Sanjay K. Banerjee,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 24  

页码: 3564-3566

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120392

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Germanium quantum dots have been grown on Si substrates at various temperatures for different durations and studied with atomic force microscopy to determine the growth conditions for the smallest and most uniform size quantum dots.Ge1−xCxquantum dots grown at varying Ge:C ratios have been characterized to study the effects of strain compensation by C. The effects of P and B doping on both Ge andGe1−xCxdots have also been investigated. The results show fewer quantum dots inGe1−xCxdue to strain compensation of Ge by C, and suggest the formation of larger dots with P doping and smaller and more uniform dots with B doping. X-ray diffraction measurements on the samples show the strain in the films, with the rocking curves changing with the ratio of C in the quantum dots. ©1997 American Institute of Physics.

 

点击下载:  PDF (171KB)



返 回