MBE growth of extremely high‐quality GaAs–AlGaAs GRIN‐SCH lasers with a superlattice buffer layer
作者:
T. Fujii,
S. Hiyamizu,
S. Yamakoshi,
T. Ishikawa,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1985)
卷期:
Volume 3,
issue 2
页码: 776-778
ISSN:0734-211X
年代: 1985
DOI:10.1116/1.583096
出版商: American Vacuum Society
关键词: FABRICATION;SUPERLATTICES;LASER CAVITIES;CURRENT DENSITY;THRESHOLD CURRENT;FABRY−PEROT INTERFEROMETER;POTENTIALS;MOLECULAR BEAM EPITAXY;SEMICONDUCTOR LASERS;GALLIUM ARSENIDES;ALUMINIUM ARSENIDES;EXPERIMENTAL DATA;IMPURITIES
数据来源: AIP
摘要:
It was found that a thick AlGaAs layer grown on a GaAs–AlGaAs superlattice buffer layer does not affect the optical quality of single quantum well structure successibly grown on the AlGaAs layer; that is, background impurities such as carbon and oxygen, which would come from residual gases, do not accumulate on the AlGaAs surface during molecular beam epitaxy (MBE) growth. Extremely high‐quality GaAs–AlGaAs GRIN‐SCH lasers were obtained by introducing a superlattice buffer layer. The minimum threshold current density of 175 A/cm2was achieved for a broad‐area Fabry–Perot laser with a cavity length of 450 μm at room temperature. This is the lowest threshold current density of semiconductor lasers with a similar cavity length.
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